Facet mirror having a number of mirror facets

An adjusting system for a facet mirror comprising a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces and are respectively mounted jointly in a basic body via bearing devices, said mirror facets comprising mirror bodies which contact at the periphery with the bearing device at least approximately via a surface, line or point contact, wherein said basic body is provided with adjusting devices and actuators, wherein the adjustment of the mirror bodies is carried out by the effects of force (A) on the adjusting devices by the actuators, after which the position of the mirror facets in their bearing devices is fixed.

A facet mirror comprising a number of mirror facets, wherein said mirror facets are provided with reflecting surfaces and are arranged jointly in or on a basic body, and wherein sides of the mirror facets averted from the reflecting surfaces are of spherical construction.

A facet mirror comprising a number of mirror facets, wherein said mirror facets are provided with reflecting surfaces and are arranged jointly in or on a basic body, and wherein sides of said mirror facets averted from the reflecting surfaces are of planar construction.

A system for aligning a number of mirror facets comprising reflecting surfaces and spherical mounting surfaces and being respectively mounted jointly in or on a basic body via bearing devices, wherein said mirror facets are respectively moved on their spherical mounting surfaces averted from the reflecting surface, and in the process are rotated about the center (M′) of these spheres, a tilting or a lateral displacement being carried out for positioning said mirror facets.

A system for aligning a number of mirror facets comprising reflecting surfaces and spherical mounting surfaces and being respectively mounted jointly in or on a basic body via bearing devices, wherein said mirror facets are respectively moved on their spheres averted from the reflecting surfaces, and in the process are rotated about the center (M′) of these spheres, a tilting and a lateral displacement being carried out for positioning said mirror facets.

A system for aligning a number of mirror facets comprise reflecting surfaces and being respectively mounted jointly in or on a basic body via bearing devices, wherein said mirror facets comprise surfaces of planar construction averted from the reflecting surfaces, and they are displaced on the basic body for positioning said mirror facets.

A projection exposure machine in microlithography comprising an illuminating system and comprising a projection objective, with at least one facet mirror comprising a number of mirror facets, wherein said mirror facets are provided with reflecting surfaces and are mounted jointly in or on a basic body, and wherein sides of said mirror facets averted from the reflecting surfaces are of spherical construction and are adjustable in or on said basic body.

A projection exposure machine in microlithography comprising an illuminating system and comprising a projection objective, with at least one facet mirror comprising a number of mirror facets, wherein said mirror facets are provided with reflecting surfaces and are mounted jointly in or on a basic body, and wherein sides of said mirror facets averted from the reflecting surfaces are of planar construction and are adjustable in or on said basic body.

A projection exposure machine in microlithography comprising an illuminating system and comprising a projection objective with at least one facet mirror comprising a number of mirror facets, wherein mirror facets are provided with reflecting surfaces and are mounted jointly in or on a basic body, said mirror facets comprising mirror bodies contacting at the periphery with bearing devices via a surface-, line- or point-contact in or on said basic body.