Transparent conductive film and its manufacturing method, and photoelectric transducer comprising it

A transparent conductive film whose area occupied by projections that, when their cross section shape is regarded as a trapezoid, have a slope of an upper side with respect to a lower side of the trapezoid of not more than 20° and a ratio of a length of the upper side with respect to the lower side at least 0.8, corresponds to not more than 10% of an area of a surface on which the transparent conductive film is formed.

A transparent conductive film that is a thin film whose main component is tin oxide and which has a thickness of at least 400 nm, and in which the variance of the diameter of projections in its surface is not more than 0.01 μm2.

A manufacturing method for a transparent conductive film,

• wherein a transparent conductive film is formed on a surface of a substrate at 550° C. to 650° C. through a thermal decomposition method, and
• wherein a mixed gas used in the thermal decomposition method includes at least 10 mole percent of a gas whose density in a standard state is not more than 1 g/L.

A manufacturing method for a transparent conductive film,

• wherein a transparent conductive film is formed through a thermal decomposition method, and
• wherein a mixed gas used in the thermal decomposition method includes a chlorine atom containing gas at a concentration of not more than 10 mole percent and tin compounds.