Irradiation-assisted immobilization and patterning of nanostructured materials on substrates for device fabrication
AssigneeSeagate Technology LLC
InventorsXiaomin Yang, Chao Liu, Earl Chrzaszcz Johns, Paul Max Jones
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Abstract
A method of fabricating a device comprising: depositing a self-assembled monolayer on a substrate; depositing a layer of surfactant coated nanostructured materials onto the self-assembled monolayer; and irradiating the layer of surfactant coated nanostructured materials and the self-assembled monolayer to bond nanostructured materials in the layer of surfactant coated nanostructured materials to the self-assembled monolayer. The method can be used to produce immobilized layers and/or patterned layers of nanostructured materials. Devices fabricated according to the method are also included.
Claims21
A method of fabricating a device comprising:
- depositing a self-assembled monolayer on a substrate;
- depositing a layer of surfactant coated nanostructured materials onto the self-assembled monolayer;
- and
- irradiating the layer of surfactant coated nanostructured materials and the self-assembled monolayer to bond nanostructured materials in the layer of surfactant coated nanostructured materials to the self-assembled monolayer.
A device comprising:
- a self-assembled monolayer on a substrate;
- a layer of surfactant coated nanostructured materials on the self-assembled monolayer;
- and
- wherein the surfactant coated nanostructured materials and the self-assembled monolayer are covalently bonded to each other.
Dependencies are inferred from the claim text.