US 2004/0200510 A1 · Apparatus and method for splash-back proofing

Abstract

This invention relates to an apparatus for splash-back proofing, being used for treating a panel or substrate in photolithographic process. The present invention prevents a liquid (such as developer or photoresist solution) dripping on the surface of the substrate or panel from splashing back to the substrate or panel after scattering to the periphery of the substrate or panel by spin-coating. The splashing-back liquid will bring about defects in the patterning or photolithographic process, and result in deterioration of products. The apparatus for splash-back proofing includes a rotating device, at least a liquid spray unit, a guard means surrounding part of the rotating device and a roughening unit. Also, a method for splash-back proofing is disclosed.

Claims14

Dependent claims

An apparatus for splash-back proofing adopted for a substrate, comprising:

a rotating device for holding and rotating said substrate;
at least a liquid spray unit mounted on one side of said rotating device for spraying a liquid to said substrate;
a guard means surrounding part of said rotating device for preventing said liquid from scattering to an outer portion of said rotating device;
and
a roughening unit overlaying part of said guard means for preventing said liquid hitting against said guard means from splashing-back.

2 more elements

Dependencies are inferred from the claim text.

Apparatus and method for splash-back proofing

Life of this patent

Apparatus and method for splash-back proofing

Life of this patent

Abstract

Claims14