Low emissivity glass and method for production thereof

Abstract

The present invention provides a low emissivity glass including a first layer containing silicon oxide as its main component, a second layer containing tin oxide as its main component, a third layer containing silicon oxide as its main component, and a fourth layer containing tin oxide as its main component that are formed on a glass sheet with a thickness of at least 6 mm. The low-emissivity glass has a haze ratio of 0.7% or lower. In this low emissivity glass, the glass ribbon has a surface temperature of at least 700° C. when the first layer is deposited and a surface temperature of at least 640° C. when the second to fourth layers are deposited. It can be produced by a method involving thermal decomposition of a coating-film depositing material, for instance, by a CVD method.

Dependencies are inferred from the claim text.