Method and apparatus for measuring the shape and thickness variation of polished opaque plates
AssigneePhase Shift Technology, Inc.
InventorsKlaus Freischlad, Shouhong Tang
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AssigneePhase Shift Technology, Inc.
InventorsKlaus Freischlad, Shouhong Tang
Estimating the term…
The present invention consists of a technique and device for measuring the thickness variation and shape of wafers or other polished opaque plates. A combination of two improved phase-shifting Fizeau interferometers is used to simultaneously measure the single-sided distance maps between each side of the wafer and the corresponding reference flat, with the thickness variation and shape being calculated from these data. Provisions are made to determine and eliminate the shape and tilt of the reference surfaces, and also to facilitate the correct overlay of the two single-sided measurements for the calculation of thickness variation and shape.
A method for measuring the thickness variation and shape of polished opaque plates including the steps of:
An apparatus for measuring the thickness variation and shape of polished opaque plates including in combination:
Dependencies are inferred from the claim text.