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US 2004/0175659 A1Published application
Photosensitive composition for sandblasting and photosensitive film using the same
AssigneeTokyo Ohka Kogyo Co., Ltd., a Japan corporation
InventorsAkira Kumazawa, Ryuma Mizusawa, Syunji Nakazato, Hiroyuki Obiya
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Abstract
A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.
Claims9
A photosensitive composition for sandblasting comprising the components of:
- (A) aphotopolymerizableurethane (meth)acrylateoligomer comprising (meth)acryloyl group;
- (B) an acrylic copolymer;
- and
- (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, a copolymerizable monomer comprising one of a benzene ring and a cyclohexyl group.
1 more element
Dependencies are inferred from the claim text.