Photosensitive composition and use thereof
AssigneeAZ Electronic Materials USA Corp.
InventorsHong Zuang, Joseph E. Oberlander, Ping-Hung Lu, Stanely F. Wanat, Robert R. Plass
Life of this patent
Estimating the term…
Loading patent…
AssigneeAZ Electronic Materials USA Corp.
InventorsHong Zuang, Joseph E. Oberlander, Ping-Hung Lu, Stanely F. Wanat, Robert R. Plass
Estimating the term…
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.
A composition comprising:
A composition comprising:
A composition comprising
A composition comprising
A composition comprising
Dependencies are inferred from the claim text.