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US 2004/0175632 A1Published application
Fusion attachment of rigid pellicles and/or frames
AssigneeIntel Corporation
InventorEmily Yixie Shu
Life of this patent
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Abstract
A rigid pellicle, used to protect a patterned reticle from contamination in a lithographic process in the manufacture of integrated circuits, is attached to a mounting frame by fusing the pellicle and frame together. In one embodiment, an infrared laser beam is used to produce the fusion along the seam between the pellicle and the frame. The frame may also be attached to the reticle through a similar fusion process. In one embodiment, the pellicle, frame, and reticle are all comprised of fused silica.
Claims22
An apparatus, comprising:
- a pellicle fused to a frame;
- and
- a reticle attached to the frame.
A method, comprising:
- fusing a pellicle to a frame at a first seam between the pellicle and the frame;
- and
- attaching the frame to a reticle.
A system, comprising:
- a support to hold a pellicle and a frame in place for a fusion attachment between the pellicle and the frame;
- a laser device to fuse the pellicle to the frame;
- a structure to position a first seam between the pellicle and the frame in a path of a laser beam from the laser device;
- and
- a control device to move at least one of the pellicle and the laser relative to one another to move at least a part of the first seam through the path of the laser beam.
2 more elements
Dependencies are inferred from the claim text.