Method and apparatus of wafer print simulation using hybrid model with mask optical images

A method of automatically performing a wafer simulation, the method comprising:

• receiving a mask image;
• performing a wafer simulation of the mask image using a first model;
• characterizing a feature from the mask image;
• obtaining threshold data from a look-up table (LUT) based on characterizing, the LUT generated using a second model more accurate than the first model;
• and
• applying the threshold data to the wafer simulation to generate wafer contours of the feature.

A method of determining a wafer contour of a mask feature, the method comprising:

• simulating the wafer contour by applying an optical model to the mask feature;
• accessing resist information to determine a threshold associated with the mask feature;
• and
• improving an accuracy of the wafer contour using the threshold.

A computer-implemented program for generating a wafer contour, the program comprising:

• code for receiving a mask image;
• code for performing a wafer simulation of the mask image using an optical model;
• code for characterizing a feature from the mask image;
• code for obtaining threshold data from a look-up table (LUT) based on characterizing, the LUT generated using a resist model;
• and
• code for applying the threshold data to the wafer simulation to generate accurate wafer contours of the feature.

A method of creating a look-up table (LUT) for use in a wafer simulation, the method including.:

• receiving a test layout;
• simulating the test layout using a resist model, which provides accurate wafer edge locations of features on the test layout;
• simulating the test layout using an optical model, which provides aerial image information of features on the test layout;
• matching the wafer edge locations to the aerial image information;
• computing thresholds for a plurality of features based on matching;
• and
• storing the thresholds in the LUT.