Back to results
US 2004/0171503 A1Published application
Compositions for removing etching residue and use thereof
AssigneeAir Products and Chemicals, Inc.
InventorsRoberto John Rovito, David Barry Rennie, Dana L. Durham
Life of this patent
Estimating the term…
Abstract
A composition for removing etching residue and a method using same are disclosed herein. In one aspect, there is provided a method for removing etching residue from a substrate comprising: contacting the substrate with a composition comprising water, an organic dicarboxylic acid, a buffering agent, a fluorine source, and optionally a water miscible organic solvent.
Claims18
A method for removing etching residue from a substrate which comprises contacting said substrate with a composition comprising
- a. up to about 80% by weight of a water miscible organic solvent;
- b. about 5 to about 50% by weight of water;
- c. about 1 to about 20% by weight of a dicarboxylic organic acid;
- d. about 0.5 to about 20% by weight of a base, which in combination with the above diacid, forms a buffering agent;
- and
- e. about 0.1 to about 10% by weight of a source of fluoride ion.
3 more elements
Dependencies are inferred from the claim text.