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US 2004/0171178 A1Published application
Forming a semiconductor device feature using acquired parameters
AssigneeIntel Corporation
InventorsDane L. Scott, Kevin J. Vasquez
Life of this patent
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Abstract
In one embodiment of the present invention, a method includes acquiring parameters for a desired feature of a semiconductor device; determining a data array using the parameters; and forming the desired feature using the data array. The desired feature in one embodiment may be a backside trench.
Claims20
A method comprising:
- acquiring parameters for a desired feature of a semiconductor device;
- determining a data array using the parameters;
- and
- forming the desired feature using the data array.
1 more element
A method comprising:
- calculating a plurality of patterns corresponding to a desired feature of a semiconductor device from a set of parameters;
- and
- forming the desired feature using the plurality of patterns.
An article comprising a machine-readable storage medium containing instructions that if executed enable a system to:
- calculate a plurality of patterns corresponding to a desired feature of a semiconductor device from a set of parameters;
- and
- form the desired feature using the plurality of patterns.
Dependencies are inferred from the claim text.