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US 2004/0170926 A1Published application
Dipole illumination
AssigneeIntel Corporation
InventorManish Chandhok
Life of this patent
Estimating the term…
Abstract
A system for fabricating patterns on a semiconductor, the system includes a first aperture having two openings aligned in a first axis, a first mask, a second aperture having two openings aligned in a second axis, and a second mask. The system may be implemented with the second axis substantially perpendicular to the first axis.
Claims24
A system for fabricating patterns on a semiconductor, the system comprising:
- a first aperture having two openings aligned in a first axis;
- a first mask;
- a second aperture having two openings aligned in a second axis:
- and
- a second mask.
2 more elements
A method of forming a pattern on a semiconductor comprising:
- transmitting light through a first aperture having at least two openings aligned in a first axis;
- transmitting the light from the first aperture through a first mask onto a semiconductor substrate;
- transmitting light through a second aperture having at least two openings aligned in a second axis;
- and
- transmitting light from the second aperture through a second mask onto the semiconductor substrate.
2 more elements
An apparatus comprising:
- a first aperture having two openings aligned in a first axis;
- a first mask;
- a second aperture having two openings aligned in a second axis;
- and
- a second mask.
2 more elements
Dependencies are inferred from the claim text.