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US 2004/0170925 A1Published application
Positive imageable thick film compositions
OwnerDavid Herbert Roach, Young H. Kim +1inventors
InventorsDavid Herbert Roach, Young H. Kim, Lap-Tak Andrew Cheng
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Abstract
This invention provides compositions that can be used as positive imageable photoresists. These compositions include positive imageable photopolymer systems and particulate materials. These compositions can be used in thick film and other processes to make films and patterned structures that are useful in producing electronic devices.
Claims40
A positive imageable, particulate-filled photoresist composition comprising (a) at least one positive imageable photopolymer system, and (b) about 1 to about 70 vol % particulates.
Dependencies are inferred from the claim text.