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US 2004/0170764 A1Published application
Method for coating photoresist on a substrate
OwnerYung-Chang Chen, Jia-Pang Pang +1inventors
InventorsYung-Chang Chen, Jia-Pang Pang, Chien-Ting Lai
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Abstract
A method for coating photoresist (300) on a substrate (100) includes the steps of forming grooves (120) on the substrate, applying photoresist onto the substrate, and finally vibrating the substrate. The photoresist can be coated on the substrate evenly, and the efficiency of utilization of the photoresist is high.
Claims11
A method for coating photoresist on a substrate, comprising the steps of:
- forming grooves on the substrate;
- applying photoresist on the substrate;
- and
- vibrating the substrate.
1 more element
A method for coating photoresist on a substrate, comprising the steps of:
- forming recesses on the substrate;
- applying photoresist on the substrate;
- and
- vibrating the substrate so as to have the photoresist occupies said recesses evenly.
1 more element
A method for coating photoresist on a substrate, comprising the steps of:
- a) forming protrusions on the substrate;
- b) applying photoresist on the substrate;
- and
- c) vibrating the substrate so as to have the photoresist covering the protrusions and portions beside said protrusions evenly.
1 more element
Dependencies are inferred from the claim text.