Optical device for use with a lithography method
AssigneeInfineon Technologies AG
InventorsErnst-Christian Richter, Michael Sebald
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Abstract
The invention relates to an optical lithography method and to an optical device for use with a lithography method. In particular the invention relates to optical devices for the production of semiconductor devices, wherein the optical device includes a lens system positioned, with respect to the optical path, behind a mask, and wherein, in an area between the mask and the lens system, a medium is provided which has a refractive index (n) greater than 1.
Claims20
An optical device for lithography comprising a lens system positioned, with respect to the optical path, behind a mask,
- wherein in an area between the mask and the lens system a medium is provided which has a refractive index (n) greater than 1.
An optical lithography method, comprising:
- providing a lens system
- providing a mask;
- and
- providing a medium which has a refractive index (n) greater than 1, in an area between the mask and the lens system.
Dependencies are inferred from the claim text.