Apparatus and method for detection and measurement of environmental parameters
OwnerVladimir Krazinventor
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OwnerVladimir Krazinventor
Estimating the term…
The present invention provides a device for in-situ measurement and recording of various environmental parameters in a semiconductor fabrication process. The device comprises sensors for detecting the parameters and converting them to sensor outputs; and a data logger coupled to the sensors for receiving the sensor outputs and logging them in a file. The device may also comprise an analog to digital converter to convert the sensor outputs to digital data and a communication module to communicate the digital data with other devices. When applied to reticles used in a semiconductor fabrication process comprising a plurality of stages, the device may be used to monitor electrostatic field and electrostatic discharge activities on and around the reticle, convert the monitored parameters into data, and log the data along with a timestamp and an identification of each individual stage. Logged data can be retrieved and analyzed to determine the time and location of detrimental activities such as electrostatic discharge on reticles.
A device for in-situ measurement and recording of at least one parameter in a process, said device comprising:
A device for in-situ measurement and recording of at least one parameter in a process, said device comprising:
A method for in-situ measurement and recording of at least one parameter in a semiconductor fabrication process comprising a plurality of stages, said method comprising:
A device for in-situ monitoring of at least one environmental parameter in a photolithographic process comprising a plurality of stages, said device comprising:
A device for use in conjunction with a reticle for in-situ monitoring of at least one electrical parameter in a semiconductor fabrication process comprising a plurality of stages, said device comprising:
A method for in-situ measurement and recording of at least one parameter in a semiconductor fabrication process comprising at least one stage, said method comprising:
A device for monitoring environmental parameters comprising:
A method for localizing electrostatic discharges (ESD) by detecting electrostatic discharges and electrostatic field, the method comprising:
A device for localizing electrostatic discharges affecting a unit by detecting an electrostatic discharge and electrostatic field, the device comprising:
A method for localizing electrostatic discharges (ESD) by detecting electrostatic discharges and electrostatic field, the method comprising:
A device for localizing electrostatic discharges affecting a unit by detecting an electrostatic discharge and electrostatic field;
Dependencies are inferred from the claim text.