Film deposition system
OwnerKentaro Asakura, Takaya Shimizuinventors
Life of this patent
Estimating the term…
Abstract
This invention includes a processing vessel capable of being evacuated to make a vacuum therein and a stage placed in the processing vessel capable of supporting an object to be processed thereon. A guide ring is placed on or above the stage so as to surround the outer circumference of the object to be processed mounted on the stage, is adapted to guide the object to be processed onto the stage when mounting the object to be processed onto the stage. A particle generation preventing space is formed between an inner peripheral part of the lower surface of the guide ring and the upper surface of the stage.
Claims10
A film deposition system comprising:
- a processing vessel capable of being evacuated to make a vacuum therein;
- a stage placed in the processing vessel, capable of supporting an object to be processed thereon;
- and
- a guide ring placed on or above the stage so as to surround an outer circumference of the object to be processed mounted on the stage, capable of guiding the object to be processed onto the stage when mounting the object to be processed onto the stage;
- wherein a particle generation preventing space is formed between an inner peripheral part of a lower surface of the guide ring and an upper surface of the stage.
A film deposition system comprising:
- a processing vessel capable of being evacuated to make a vacuum therein;
- a stage placed in the processing vessel, capable of supporting an object to be processed thereon;
- and
- a clamping ring supported on or above the stage, capable of pressing and fixing an outer peripheral part of the object to be processed mounted on the stage;
- wherein a particle generation preventing space is formed between an inner peripheral part of the lower surface of the clamping ring and the upper surface of the stage.
Dependencies are inferred from the claim text.