Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYouichi Ohsawa, Katsuhiro Kobayashi, Yoshitaka Yanagi, Kazunori Maeda
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Abstract
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
Claims15
A sulfonyldiazomethane compound having the following general formula (1):
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- wherein R is each independently a substituted or unsubstituted straight, branched or cyclic alkyl group of 1 to 4 carbon atoms, G is SO2 or CO, R3 is a substituted or unsubstituted straight, branched or cyclic alkyl group of 1 to 10 carbon atoms or a substituted or unsubstituted aryl group of 6 to 14 carbon atoms, p is 1 or 2, q is 0 or 1, satisfying p+q=2, m is an integer of 3 to 11, and k is an integer of 0 to 4, with the proviso that in the event k is at least 1, at least one of R associated with k may bond with the R at the 4-position to form a cyclic structure with the carbon atoms on the benzene ring to which these R's are attached, and then, these two R's bond together to form an alkylene group of 3 to 4 carbon atoms.
A sulfonyldiazomethane compound having the following general formula (1a):
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- wherein R is each independently a substituted or unsubstituted straight, branched or cyclic alkyl group of 1 to 4 carbon atoms, and m is an integer of 3 to 11.
Dependencies are inferred from the claim text.