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US 2004/0165271 A1Published application
Enhancing light coupling efficiency for ultra high numerical aperture lithography through first order transmission optimization
OwnerChristof Gabriel Krautschik, Maciek E. Orczyk +1inventors
InventorsChristof Gabriel Krautschik, Maciek E. Orczyk, John M. Urata
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Abstract
A first order transmission optimization (FOTO) top coat may be provided on a photoresist layer to improve the coupling efficiency of first order diffracted light waves during a lithographic imaging operation. The top coat may be a relatively thin layer of a relatively low absorption, low refractive index material. The top coat may be provided in addition to a bottom anti-reflective coating (BARC).
Claims27
An article comprising:
- a wafer having a surface;
- a layer of photoresist material over the wafer surface;
- a top coat on the photoresist layer operative to substantially cancel a reflected portion of radiation having a wavelength λ.
An article comprising:
- a wafer having a surface;
- a layer of photoresist material over the wafer surface;
- a bottom anti-reflective coating (BARC) between the wafer and the layer of photoresist material;
- and
- a top coat on the photoresist layer operative to substantially cancel a reflected portion of radiation having a wavelength λ.
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A method comprising:
- depositing a top coat on a layer of photoresist material over a substrate;
- exposing the top coat to light in a lithography system having a numerical aperture (NA) of about 0.8 or higher, said light including a Transverse Electric (TE) polarization mode energy;
- and
- coupling greater than about 80% of the TE polarization mode energy into the photoresist material.
1 more element
Dependencies are inferred from the claim text.