Method and apparatus for characterization of optical systems
AssigneeASML Holding N.V.
InventorMatthew E. Hansen
Life of this patent
Estimating the term…
Loading patent…
AssigneeASML Holding N.V.
InventorMatthew E. Hansen
Estimating the term…
Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations may be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space.
A method, comprising:
A method, comprising:
A method, comprising:
An apparatus, comprising:
Dependencies are inferred from the claim text.