[substrate exposure apparatus and method]
OwnerKuo-Tso Cheninventor
Life of this patent
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Abstract
A substrate exposure apparatus, having a line light source and a control system. The line light source has several point light sources. The control system converts the pattern into a timing signal to control the light status and dark status of each point light source. The control system also controls a scan light source to radiate the photoresist on the substrate, so that the photoresist is exposed. Further, in a substrate exposure method, multiple point light sources are arranged as at least one line light source to scan the photoresist once or several times to obtain a better resolution of the pattern transferred to the photoresist.
Claims16
A substrate exposure apparatus, applicable to transfer a pattern to a photoresist on a surface of a substrate, the substrate exposure apparatus comprising:
- a scan light source, disposed at a position spaced from a surface of the photoresist on the substrate with a distance, and the scan light source comprising a plurality of point light sources;
- and
- a scan control system, converting the pattern into a timing signal to control light and dark status of each of the point light sources at different times, the scan control system further allows the substrate exposure apparatus to have a scan function, such that the scan light source scans the photoresist at least once along a scan path for exposure.
Dependencies are inferred from the claim text.