Cooling mechanism
AssigneeCanon Kabushiki Kaisha
InventorShinichi Hara
Life of this patent
Estimating the term…
Abstract
A cooling mechanism for cooling an optical element disposed in a vacuum atmosphere includes a support part for supporting the optical element, which has a channel having an inlet, into which gas is supplied, and an outlet, from which the gas is exhausted, and a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.
Claims31
A cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, said cooling mechanism comprising:
- a support part for supporting the optical element, said support part having a channel having an inlet, into which gas is supplied, and an outlet, from which the gas is exhausted;
- and
- a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.
A cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, the optical element having a channel having an inlet into which gas is supplied, and an outlet, from which the gas is exhausted, said cooling mechanism comprising:
- a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.
An exposure apparatus comprising a cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, wherein the cooling mechanism includes a support part for supporting the optical element, said support part having a channel having an inlet into which gas is supplied, and an outlet, from which the gas is exhausted, and a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.
An exposure apparatus comprising a cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, the optical element having a channel having an inlet, into which gas is supplied, and an outlet, from which the gas is exhausted, wherein said cooling mechanism includes a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.
An exposure apparatus for illuminating a pattern with light and for exposing an object using the light from the pattern, said exposure apparatus comprising:
- at least one optical element;
- and
- a cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, wherein the cooling mechanism includes a support part for supporting the optical element, said support part having a channel having an inlet into which gas is supplied, and an outlet, from which the gas is exhausted, and a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.
An exposure apparatus for illuminating a pattern with light and for exposing an object using the light from the pattern, said exposure apparatus comprising:
- at least one optical element;
- and
- a cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, the optical element having a channel having an inlet into which gas is supplied, and an outlet, from which the gas is exhausted, wherein said cooling mechanism includes a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.
A device fabrication method comprising the steps of:
- exposing an object with by using an exposure apparatus that includes a cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, wherein the cooling mechanism includes a support part for supporting the optical element, said support part having a cannel having an inlet, into which gas is supplied, and an outlet, from which the gas is exhausted, and a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied;
- and
- developing the object that has been exposed.
A device fabrication method comprising the steps of:
- exposing an object with by using an exposure apparatus that includes a cooling mechanism for cooling an optical element disposed in a vacuum atmosphere, the optical element having a channel having an inlet into which gas is supplied, and an outlet, from which the gas is exhausted, wherein said cooling mechanism includes a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied;
- and
- developing the object that has been exposed.
A cooling mechanism for cooling an optical disposed in a vacuum atmosphere, said cooling mechanism comprising:
- a radiation member provided opposite to and apart from the optical element;
- a Peltier element that contacts said radiation member in one area;
- a radiation block that contacts the Peltier element in another area, and has a channel with an inlet to which gas is supplied, and an outlet from which the gas is exhausted;
- and
- a decompression mechanism, disposed in the channel, for reducing pressure of the gas supplied.
An exposure apparatus comprising:
- at least one optical element for introducing light from a light source to an object to be exposed;
- and
- a cooling mechanism for cooling the at least one optical element,
- wherein said cooling mechanism includes:
- a radiation member provided opposite to and apart from the optical element;
- a Peltier element that contacts said radiation member in one area;
- a radiation block that contacts the Peltier element in another area, and has a channel with an inlet to which gas is supplied, and an outlet from which the gas is exhausted;
- and
- a decompression mechanism, disposed in the channel, for reducing pressure of the gas supplied.
A device fabrication method comprising the steps of:
- exposing an object with by using an exposure apparatus that includes at least one optical element for introducing light from a light source to an object to be exposed;
- and a cooling mechanism for cooling the at least one optical element, wherein said cooling mechanism includes a radiation member provided opposite to and apart from the optical element, a Peltier element that contacts said radiation member in one area, a radiation block that contacts the Peltier element in another area, and has a channel with an inlet to which gas is supplied, and an outlet from which the gas is exhausted, and a decompression mechanism, disposed in the channel, for reducing pressure of the gas supplied;
- and
- developing the object that has been exposed.
Dependencies are inferred from the claim text.