Loading patent…
AssigneesEpichem Limited, IQE plc
InventorsMegan Ravetz, Graham Williams, Andrew Nelson, Roy Trevor Blunt, Howard Williams, Rajesh Odedra
Estimating the term…
PURPOSE: To improve the evaporation efficiency of a raw material by mounting an element of a porous sintered metal having the pore size smaller than the size of the solid raw material to a port for introducing a carrier gas into a bubbler vessel. CONSTITUTION: The solid raw material 2 is housed in the bubbler vessel 1 and is heated by a mantle heater, etc. The carrier gas is introduced from the introducing port 9 into the vessel 1 to generate the saturation pressure of the raw material 2. This material is sent into a film forming chamber 10 of the CVD device from a leading out pipe 8. The element 11 of the porous sintered metal is mounted to this introducing port 9. The carrier gas is ejected to a wide range from the many fine pores of the element 11 to the circumferences thereof and is uniformly dispersed. The wider contact area of the raw material 2 with the carrier gas is taken and the sufficient saturated steam pressure is obtd. The back flow of the raw material 2 to the mass flow controller is obviated even if the pressure on the film forming chamber 10 side increases. The damaging of the controller 4 is thus prevented.
A method for delivering an organometallic compound to a plurality of reactor sites, the method comprising the step of introducing a carrier gas into a container of the organometallic compound, picking up the compound in the gas to form a gaseous mixture, transporting the gaseous mixture to a reservoir and selectively distributing the gaseous mixture to one or more of a plurality of reactor sites, the method excluding the step of condensing the gaseous mixture.
A method as claimed in any one of the preceding claims wherein the pick up of organometallic compound in the carrier gas is kept constant.
A method as claimed in any one of the preceding claims wherein the carrier gas is hydrogen.
An apparatus for delivering an organometallic compound to a plurality of reactor sites, the apparatus comprising an inlet for introducing a carrier gas (2) into a container (1) of the organometallic compound, a reservoir for storage of the gaseous mixture of the compound and the carrier gas and an outlet for selectively distributing the gaseous mixture to one or more of a plurality of reactor sites (12, 14, 16, 18, 20), the apparatus excluding a condensor for condensation of the gaseous mixture.
An apparatus as claimed in claim any one of the preceding claims wherein the container (1) of organometallic compound is a bubbler, the carrier gas being introduced into the bubbler by means of a dip pipe (3).
A bubbler (100) comprising a container for precursor and a dip pipe (102) for passage of a carrier gas therethrough to pick up the precursor in the gas, wherein the bubbler includes one or more of the following features:
Dependencies are inferred from the claim text.