Substrate processing apparatus for drying substrate
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsHiroaki Sugimoto, Seiichiro Okuda, Akio Hashizume
Life of this patent
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Abstract
A substrate processing apparatus includes a container in which a heating plate, a discharge nozzle for discharging a vapor of organic solvent, and a discharge nozzle for supplying a process gas and a cooling gas are provided. A pump in communication with an exhaust outlet of the container exhausts an atmosphere from the container to reduce pressure in the container. Therefore, the substrate processing apparatus is capable of performing (1) the process of drying a substrate in a reduced-pressure atmosphere by the use of the vapor of organic solvent, and (2) the process of drying the substrate in the reduced-pressure atmosphere by heating, to thereby efficiently dry the substrate.
Claims19
A substrate processing apparatus for drying a substrate after a rinsing solution adhering to a surface of the substrate is spun off by rotating the substrate, said substrate processing apparatus comprising:
- a container for receiving a substrate;
- a holding element provided in said container for holding said substrate in a gaseous atmosphere;
- an organic solvent discharge element for discharging an organic solvent into said container to create an atmosphere containing said organic solvent near said substrate held by said holding element;
- a pressure reduction element for exhausting said container to create a reduced-pressure atmosphere in said container;
- and
- a controller for controlling said organic solvent discharge element and said pressure reduction element to maintain the interior of said container at substantially the same pressure for a fixed length of time after said organic solvent is discharged into said container containing said reduced-pressure atmosphere.
A substrate processing apparatus for drying a substrate after a rinsing solution adhering to a surface of the substrate is spun off by rotating the substrate, said substrate processing apparatus comprising:
- a first container for receiving a substrate;
- a first holding element provided in said first container for holding said substrate in a gaseous atmosphere;
- a heating element provided in said first container for heating said substrate held by said first holding element;
- a first process gas discharge element for discharging a process gas into said first container;
- and
- a first pressure reduction element for reducing pressure in said first container.
A substrate processing apparatus for drying a substrate after a rinsing solution adhering to a surface of the substrate is spun off by rotating the substrate, said substrate processing apparatus comprising:
- a container for receiving a substrate;
- a holding element provided in said container for holding said substrate in a gaseous atmosphere;
- an organic solvent discharge element for discharging an organic solvent into said container to create an atmosphere containing said organic solvent near said substrate held by said holding element;
- a heating element provided in said container for heating said substrate held by said holding element;
- a process gas discharge element for discharging a process gas into said container;
- and
- a pressure reduction element for reducing pressure in said container.
Dependencies are inferred from the claim text.