Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component
OwnerNobuyuki Nagayama, Kouji Mitsuhashi +1inventors
InventorsNobuyuki Nagayama, Kouji Mitsuhashi, Hiroyuki Nakayama
Life of this patent
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Abstract
With a coating-film-forming coating agent 51 used as a resist including a main component such as cyclorubber-bisazide and a photosensitive component, by immersing deposits 52 deposited on the coating film of the coating agent 51 formed on an in-chamber component 50 in a release liquid such as acetone together with the in-chamber component 50 removed from within a chamber 22, the deposits 52 attached to the coating film can be removed along with the coating film from the in-chamber component 50 concurrently with the release of the coating film.
Claims7
(Amended) An in-chamber member to use in the chamber for performing a plasma process, the in-chamber member comprising:
- a coating film to which reaction by-products originated from the plasma process are absorbed, the coating film being made of a resist and separated from the in-chamber member in a peeling solvent.
(Amended) A method for cleaning an in-chamber member disposed in the chamber for performing a plasma process and on which reaction by-products produced by the plasma process are absorbed, the method comprising the steps of:
- forming in advance a coating film made of a resist on a surface of the in-chamber member;
- and
- after performing the plasma process, immersing the in-chamber member into a peeling solvent to thereby remove the reaction by-products absorbed to the coating film from the in-chamber member together with the coating film that is being separated.
(Cancelled)
Dependencies are inferred from the claim text.