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US 2004/0107412 A1Published application
Method and system for context-specific mask writing
AssigneeCadence Design Systems, Inc.
InventorsRobert C. Pack, Louis K. Scheffer
Life of this patent
Estimating the term…
Abstract
A method for generating lithography marks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.
Claims36
A method for writing a mask, comprising:
- generating integrated circuit design data;
- and
- using information for interfeature relationships of the integrated circuit design data to write the mask.
A method for generating a lithography mask or a printed wafer, comprising:
- generating integrated circuit design data;
- and
- using context information from the integrated circuit design data to write the mask or printed wafer.
An apparatus for mask writing comprising:
- means for generating a design of an integrated circuit design;
- means for producing circuit contextual information for the integrated circuit design;
- means for capturing the circuit contextual information in a mask design database;
- means for producing mask contextual information for mask elements in the mask design database based on the circuit contextual information;
- means for configuring the mask design database to reflect the mask contextual information;
- and
- means for writing the mask elements on a mask substrate.
4 more elements
A method for mask writing, comprising:
- designing an integrated circuit;
- passing the design data to a context and priority analysis step;
- analyzing design data for each mask element to determine a circuit function, circuit criticality context, and priority for each mask element;
- including the circuit function, circuit criticality context, and priority data in a mask design data file;
- and
- using the mask design data file to write a mask.
3 more elements
A system for writing a mask, comprising:
- means for generating integrated circuit design data;
- and
- means for using information for interfeature relationships of the integrated circuit design data to write the mask.
A system for generating a lithography mask or a printed wafer, comprising:
- means for generating integrated circuit design data;
- and
- means for using context information from the integrated circuit design data to write the mask or printed wafer.
Dependencies are inferred from the claim text.