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US 2004/0106071 A1Published application
Photoresist overcoating composition
OwnerYoung Sun Hwang, Sam Young Kim +1inventors
InventorsYoung Sun Hwang, Sam Young Kim, Jae Chang Jung
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Abstract
Photoresist overcoating compositions are disclosed. More specifically, a photoresist overcoating composition comprising a compound represented by Formula 1 is disclosed that can reduce critical dimension difference between the center and the edge of a wafer in a patterning process.
Claims7
A photoresist overcoating composition comprising:
- a solvent;
- and
- a compound represented by Formula 1:
- 3
- wherein
- R′ is H or CH3;
- R1 and R2 individually are H or C1-C3 alkyl.
4 more elements
Dependencies are inferred from the claim text.