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US 2004/0106070 A1Published application
Method to enhance resolution of a chemically amplified photoresist
AssigneeInternational Business Machines Corporation
InventorsWaikin Li, Chung-Hsi Wu
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Abstract
A method to enhance resolution of a chemically amplified photoresist generally includes forming a relief image in the chemically amplified photoresist, wherein the relief image comprises a feature having a first dimension; and contacting the relief image with an aqueous acidic solution for a period of time effective to reduce first dimension of the relief image to a second dimension.
Claims12
A method to enhance resolution of a chemically amplified photoresist, the method comprising:
- forming a relief image of the chemically amplified photoresist on a substrate, wherein the relief image comprises a feature having a first dimension;
- and
- contacting the relief image with an aqueous acidic solution for a period of time effective to reduce first dimension of the relief image to a second dimension.
A method to enhance resolution of a chemically amplified photoresist, the method comprising:
- forming a relief image of the chemically amplified photoresist on a substrate, wherein the relief image comprises a feature having a first dimension;
- and
- contacting the relief image with an aqueous acidic solution for a period of time effective to reduce first dimension of the relief image to a second dimension, wherein the acidic solution comprises an acid compound having a pKa less than about 6;
- and
- rinsing the substrate to remove the aqueous acidic solution.
2 more elements
Dependencies are inferred from the claim text.