Resist composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Youichi Ohsawa, Takeru Watanabe
Life of this patent
Estimating the term…
Abstract
Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reaction, that is, acid diffusion upon use of a highly-reactive acid-labile group cannot be controlled. In order to overcome this problem, one or more basic compounds selected from those represented by the following formulas (I) to (III) and (1) to (4) are employed. 1 2
Claims20
A resist composition comprising one or more basic compounds selected from those represented by the following formula (I):
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- wherein, n stands for 1, 2 or 3;
- side chains Xs are the same or different and each independently represents —R1—O—R2 or —R1—C(═O)—O—R61, in which R1s are the same or different and each independently represents an alkylene group of 1 to 5 carbon atoms, R2s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms containing a carbonyl or ester group, and R61s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a carbonyl group, an ester group, an ether group, a hydroxyl group or a lactone ring, or R1 and R2, or R1 and R61 in the same side chain may be coupled together to form a ring;
- and side chains Ys are the same or different and each independently represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain an ether or hydroxyl group.
A resist composition comprising-one or more basic compounds selected from those represented by the following formulas (1) to (4).
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- wherein, R1s are the same or different and each independently represents a C1-5 alkylene group, R2s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms containing a carbonyl group or an ester group, R3 represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hydroxyl or ether group, and R4s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a carbonyl, ester or ether group.
A resist composition comprising one or more basic compounds selected from those represented by the following formula (II):
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- wherein, R62 represents a linear or branched alkylene group of 1 to 5 carbon atoms, p stands for 0, 1 or 2 with the proviso that p+q=3, R63s are the same or different and each independently represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 15 carbon atoms which may contain an ether, carbonyl, ester or hydroxyl group and R64s are the same or different and each independently represents a linear, branched or cyclic alkyl group which may contain a carbonyl group, an ester group, an ether group, a hydroxyl group or a lactone ring.
A resist composition comprising one or more basic compounds selected from those represented by the following formula (III):
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- wherein R65s are the same or different and each independently represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 15 carbon atoms which may contain an ether, carbonyl, ester or hydroxyl group.
Dependencies are inferred from the claim text.