Photoacid generators in photoresist compositions for microlithography
OwnerViacheslav Alexandrovich Petrov, Frank L Schadt IIIinventors
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Abstract
A photoresist composition having a polymeric binder; and a photoactive component selected from the group consisting of (1) hydroxamic acid sulfonoxy esters containing a perfluoroalkyl group containing at least five carbon atoms; (2) S-perfluoroalkyldibenzothiophenium salts, and (3) S-perfluoroalkyldiarylsulfonium salts. These photoactive components are compatible with the polymeric binders that are useful for imaging with exposure to light at the relatively shorter wavelengths, such as 157 nm.
Claims28
A photoresist composition comprising:
- (a) a polymeric binder;
- and
- (b) a photoactive component selected from the group consisting of
- (1) a hydroxamic acid sulfonoxy ester containing an Rf group, wherein Rf′ is CmF2m+1, wherein m is an integer of 5 to about 10;
- (2) an S-perfluoroalkyldibenzothiophenium salt wherein the alkyl group ranges from 1 to 10 carbon atoms and
- (3) an S-perfluoroalkyldiarylsulfonium salt wherein the alkyl group ranges from 1 to 10 carbon atoms.
A process for forming a relief image on a substrate having a photoresist layer comprising, in order:
- (A) imagewise exposing the photoresist layer to form imaged and non-imaged areas, wherein the photoresist layer is prepared from a photoresist composition comprising:
- (a) a polymeric binder;
- and
- (b) a photoactive component selected from the group consisting of
- (1) a hydroxamic acid sulfonoxy ester containing an Rf′ group, wherein Rf′ is CmF2m+1, m=is an integer of 5 to about 10;
- (2) an S-perfluoroalkyldibenzothiophenium salt wherein the alkyl group ranges from 1 to 10 carbon atoms;
- and
- (3) an S-perfluoroalkyldiarylsulfonium salt wherein the alkyl group ranges from 1 to 10 carbon atoms. and
- (B) developing the imagewise exposed photoresist layer to form the relief image on the substrate.
Dependencies are inferred from the claim text.