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US 2004/0105084 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsRalph Kurt, Aleksey Kolesnychenko
Life of this patent
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Abstract
A lithographic apparatus having a supply to a space in the apparatus of a composition including at least one of one or more perhalogenated C1-C6 alkanes and one or more compounds including one or more nitrogen atoms and one or more atoms selected from hydrogen, oxygen and halogen. The activation of the alkane(s) and compound(s) provides reactive species which are capable of highly selective etching of hydrocarbon species while minimizing damage to sensitive optical surfaces.
Claims20
A lithographic projection apparatus, comprising:
- a radiation system configured to provide a projection beam of radiation;
- a support configured to support a patterning device, the patterning device configured to pattern the projection beam according to a desired pattern;
- a substrate table configured to hold a substrate;
- and
- a projection system configured to project the patterned beam onto a target portion of the substrate, wherein a space in the apparatus comprises a composition containing at least one of (a) and (b), wherein (a) is one or more perhalogenated C1-C6 alkanes and (b) is one or more compounds including one or more nitrogen atoms and one or more atoms selected from hydrogen, oxygen and halogen.
2 more elements
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- providing a projection beam of radiation using a radiation system;
- projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- and
- producing reactive species of the composition, wherein a space through which the projection beam passes comprises a composition containing at least one of (a) and (b), wherein (a) is one or more perhalogenated C1-C6 alkanes and (b) is one or more compounds including one or more nitrogen atoms and one or more atoms selected from hydrogen, oxygen and halogen.
2 more elements
Dependencies are inferred from the claim text.