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US 2004/0103917 A1Published application
Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
AssigneeAsmil Netherlands B.V.
InventorGert-Jan Heerens
Life of this patent
Estimating the term…
Abstract
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
Claims20
A method of cleaning a surface of an object by removing contaminant particles from the surface of the object, the method comprising:
- placing the object in the chamber with the surface to be cleaned exposed;
- sealing the chamber;
- and
- reducing a gas pressure in the chamber, wherein the gas pressure is reduced to 10−2 mbar in less than 5 seconds.
1 more element
An apparatus for removing contaminant particles from surfaces of objects, the apparatus, comprising:
- a chamber with a door;
- a pump configured to reduce the gas pressure of the sealed chamber;
- and
- at least one of the following:
- a voltage source configured to provide an electric field to attract and remove the contaminant particles from the surface;
- an actuator configured to vibrate the object;
- an inert particle supply configured to bombard the surface of the object with inert particles;
- and
- a liquid supply configured to apply a layer of liquid to the surface of the object.
6 more elements
An apparatus for removing particles from surfaces of objects, comprising:
- a chamber with a door;
- means for reducing the gas pressure of the sealed chamber;
- and
- at least one of the following:
- means for providing an electric field to attract and remove the contaminant particles from the surface;
- means for vibrating the object;
- means for bombarding the surface of the object with inert particles;
- and
- means for applying a layer of liquid to the surface of the object.
6 more elements
A lithographic projection apparatus, comprising:
- a radiation system configured to provide a projection beam of radiation;
- a support configured to support a patterning device, the patterning device configured to pattern the projection beam according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a device configured to remove contaminant particles from surfaces of objects comprising:
- a chamber capable of being sealed;
- and
- a pump configured to reduce a gas pressure of the sealed chamber to 10−2 mbar in less than 5 seconds.
6 more elements
Dependencies are inferred from the claim text.