Apparatus for and method of smoothing substrate surface

An apparatus for smoothing a surface of a rotatably supported substrate, said apparatus comprising:

• a base plate having a surface;
• a first block having an extending arm structure, said first block being attached to said base plate so as to be movable along said surface of said base plate;
• a first roller defining an axial direction and being attached to a tip portion of said arm structure in a direction perpendicular to said surface of said base plate;
• a first mobile member attached to said arm structure so as to be movable in a direction perpendicular to said axial direction;
• a first tape-running means attached to said base plate for feeding and taking up a polishing tape through said first roller so as to advance said tape around said first mobile member;
• and
• a first moving means attached to said arm structure of said first block for moving said first mobile member;
• wherein said first mobile member has a first pad which presses said polishing tape from backside;
• and
• wherein said first mobile member moves by means of said first moving means to a retracted position where said first pad does not contact said polishing tape when said polishing tape is being run by means of said first tape-running means and to a compressing position where said first pad pushes said polishing tape when said substrate is being smoothed by said polishing tape.