Activated species generator for rapid cycle deposition processes
AssigneeApplied Materials, Inc.
InventorsDonald J. Verplancken, Ashok K. Sinha
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AssigneeApplied Materials, Inc.
InventorsDonald J. Verplancken, Ashok K. Sinha
Estimating the term…
A method for providing activated species for a cyclical deposition process is provided. In one aspect, the method includes delivering a gas to be activated into a plasma generator, activating the gas to create a volume of reactive species, delivering a fraction of the reactive species into a processing region to react within a substrate therein, and maintaining at least a portion of the the gas remaining in the plasma generator in an activated state after delivering the fraction of the gas into the process region. The plasma generator may include a high density plasma (HDP) generator, a microwave generator, a radio-frequency (RF) generator, an inductive-coupled plasma (ICP) generator, a capacitively coupled generator, or combinations thereof.
A method for delivering activated species for a cyclical deposition process, comprising:
A method for depositing films on a substrate surface, comprising:
A method for depositing films on a substrate surface, comprising:
A method for depositing a film on a substrate surface comprising:
Dependencies are inferred from the claim text.