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OwnerStephane Tisserand, Laurent Roux +4inventors
InventorsStephane Tisserand, Laurent Roux, Frank Torregrossa, Francois Flory, Ludovic Escoubas, Emmanuel Drouard
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The invention provides a waveguide comprising a channel 12 on an optical substrate 11, the refractive index of the channel being higher than that of the substrate. The waveguide includes at least one guide layer 13 arranged on the channel, the index of said guide layer being higher than that of the substrate. In addition, the channel 12 is integrated in the substrate 11. advantageously, the waveguide further includes a covering layer 14 deposited on the guide layer 13, the index of said covering layer being lower than that of the guide layer and lower than that of the channel. The invention also provides a method of fabricating the waveguide.
1/ A waveguide comprising a channel (12, 17, 25) on an optical substrate (11, 15, 20), the refractive index of the channel being higher than that of the substrate, at least one guide layer (13, 28, 22) being arranged on said channel, the index of said guide layer being higher than that of the substrate, the waveguide being characterized in that said channel (12, 17) is integrated in said substrate (11, 15).
2/ A waveguide according to claim 1, characterized in that it includes at least one covering layer (14, 19, 23) disposed on said guide layer (13, 18, 22), the index of it said covering layer being lower than that of the guide layer and lower than that of the channel (12, 17, 25).
3/ A waveguide according to any preceding claim, characterized in that the index of said guide layer (13, 18, 22) is equal to that of the substrate (11, 15, 20) multiplied by a factor greater than 1.001.
4/ A waveguide according to any preceding claim, characterized in that the thickness of the set of guide layers (13, 18, 22) lies in the range 1 μm to 20 μm.
5/ A waveguide according to any preceding claim, characterized in that said channel (12, 17, 25) results from implanting ions in said substrate (11, 15, 20).
6/ A waveguide according to any preceding claim, characterized in that the face of the substrate (11, 15, 20) on which ionic implantation is performed is made of silicon dioxide.
7/ A method of fabricating a waveguide on an optical substrate, the method comprising the following steps:
8/ A method of fabricating a waveguide on an optical substrate, the method comprising the following steps:
9/ A method according to claim 7 or claim 8, characterized in that it includes a step of annealing the substrate (15, 20) following the ion implantation step.
10/ A method according to claim 7 or claim 8, characterized in that it further comprises a step of depositing a covering layer (19, 23) on said guide layer (18, 22), the index of said covering layer being lower than that of the guide layer and lower than that of the channel (17, 25) .
11/ A method according to claim 7 or claim 8, characterized in that the index of said guide layer (18, 22) is equal to the index of the substrate (15, 20) multiplied by a factor greater than 1.001.
12/ A method according to claim 7 or claim 8, characterized in that the thickness of the set of guide layers (18, 22) lies in the range 1 μm to 20 μm.
13/ A method according to claim 7 or claim 8, characterized in that the face (15, 20) of the substrate into which ions are implanted is made of silicon dioxide.