X-ray projection exposure apparatus and a device manufacturing method

A device manufacturing method using an X-ray projection exposure apparatus comprising a mask chuck for holding a reflection X-ray mask having a mask pattern thereon, a wafer chuck for holding a wafer onto which the mask pattern is transferred, an X-ray illuminating system for illuminating the reflection X-ray mask, held by the mask chuck, with X-rays, and an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification, the mask chuck comprising a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force, said method comprising the step of:

• generating static electricity with the mechanism of the mask chuck to hold the reflection X-ray mask with the mask chuck by an electrostatic force;
• holding the wafer with the wafer chuck;
• illuminating the reflection X-ray mask with X-rays using the X-ray illuminating system;
• and
• projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification with the X-ray projection optical system to transfer the mask pattern onto the wafer.