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US 2004/0070034 A1Published application
Semiconductor device and method of forming the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJin-Taek Park, Hong-Soo Kim
Life of this patent
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Abstract
A semiconductor device including a resistor and a method of forming the same. In the semiconductor device, a conductive pattern, which connects source regions, and a resistor are formed of the same material, which can be polysilicon. In the method, the conductive pattern and the resistor are simultaneously formed. Thus, it is possible to obtain a constant sheet resistance without an additional photo mask.
Claims28
A semiconductor device comprising:
- a field isolation layer formed on a semiconductor substrate to define an active region;
- gate patterns formed on the active region;
- source regions formed in the active region between the gate patterns;
- a conductive pattern connecting the source regions and being interposed between the gate patterns;
- and
- a resistor formed on the field isolation layer,
- wherein the conductive pattern and the resistor are formed of the same material.
4 more elements
A method of forming a semiconductor device, the method comprising:
- forming a field isolation layer to define an active region at a semiconductor substrate;
- sequentially forming a gate insulation layer and a gate conductive layer on the surface of the semiconductor substrate where the field isolation layer is formed;
- sequentially patterning the gate conductive layer and the gate insulation layer to form a gate pattern including a gate insulation pattern and a gate conductive pattern on the active region;
- implanting impurities into the active region between the gate patterns, using the gate patterns as ion-implantation masks to form a source region;
- and
- forming a conductive pattern connecting the source regions and simultaneously forming a resistor on the field isolation layer.
3 more elements
A method of forming a semiconductor device, the method comprising:
- defining an active region at a semiconductor substrate;
- implanting impurities into selective areas of the active region to form source regions;
- and
- forming a conductive pattern connecting the source regions and simultaneously forming a resistor, said conductive pattern and said resistor being formed of the same material.
1 more element
A semiconductor device comprising;
- an active region on a semiconductor substrate;
- source regions in said active region;
- a conductive pattern connecting said source regions;
- and
- a resistor, wherein said conductive pattern and said resistor are formed of the same material.
2 more elements
Dependencies are inferred from the claim text.