Plasma processing system
AssigneesTokyo Electron Limited, Yasuyoshi Yasaka, Makoto Ando
InventorsNobuo Ishii, Yasuyoshi Yasaka
Life of this patent
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Abstract
An electromagnetic wave absorber (4) of a material that causes a large dielectric or magnetic loss is disposed so as to surround a region between a high-frequency wave transmitting window (3) and an antenna (32) to suppress the formation of a sanding wave by suppressing the reflection of microwaves.
Claims12
A plasma processing system that propagates plasma-producing radio-frequency waves generated by a radio-frequency power supply system through a flat antenna and a radio-frequency wave transmitting window into a vacuum vessel, produces a plasma by ionizing a process gas supplied into the vacuum vessel by the energy of the radio-frequency waves and processes a substrate placed on a substrate table arranged in the vacuum vessel with the plasma;
- wherein an electromagnetic wave absorber is disposed so as to surround a region between a surface of the radio-frequency wave transmitting window on a side of a vacuum atmosphere in the vacuum vessel and the antenna.
A plasma processing system that propagates plasma-producing radio-frequency waves generated by a radio-frequency power supply system through a flat antenna and a radio-frequency wave transmitting window into a vacuum vessel, produces a plasma by ionizing a process gas supplied into the vacuum vessel by the energy of the radio-frequency waves and processes a substrate placed on a substrate table arranged in the vacuum vessel with the plasma;
- wherein a region between an area between the radio-frequency wave transmitting window and a plasma luminescent area, and a surface of the radio-frequency wave transmitting window on the side of the antenna is divided in a direction perpendicular to the direction of propagation of the radio-frequency waves by conductive members.
Dependencies are inferred from the claim text.