Processing chamber configured for uniform gas flow

A processing system, comprising:

• a chamber body;
• a lid disposed on the chamber body and defining an interior volume therewith;
• a substrate support disposed in the interior volume and at least partially defining a processing region with the lid;
• and
• a plurality of flow control orifices disposed between the substrate support and the lid, the flow control orifices adapted to control flow of gases exiting the processing region.

A processing system, comprising:

• a chamber body;
• a lid disposed on the chamber body and defining an interior volume therewith;
• a substrate support disposed in the interior volume and at least partially defining a processing region with the lid;
• a edge ring disposed on a side of the substrate support facing the lid;
• a seal disposed between the edge ring and the lid and separating the processing region of the interior volume from a pumping region;
• and
• a plurality of flow control orifices disposed between the processing region and the pumping region of the chamber body.

A method of flowing gases through a processing chamber, comprising:

• flowing a process gas into a processing region defined between a substrate support and a lid of the chamber body;
• flowing gas from the processing region to a pumping region of the chamber body through a plurality of flow control orifices defined at the perimeter of the substrate support;
• and
• flowing process gas through an exhaust port formed in at least one of the chamber body or the lid.

A method of flowing gas through a processing chamber, comprising:

• elevating a substrate disposed on a substrate support toward a lid of the chamber body;
• compressing a seal disposed between the substrate support and the lid of the chamber body to separate a processing region bound by the seal and a pumping region of the chamber body;
• flowing process gas into the processing region;
• and
• flowing process gas from the processing region into the pumping region through a plurality of flow control orifices.