Tandem process chamber
AssigneeApplied Materials, Inc.
InventorsKevin Fairbairn, Jessica Barzilai, Hari K. Ponnekanti, W.N. (Nick) Taylor
Life of this patent
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Abstract
The present invention provides an apparatus for vacuum processing generally comprising an enclosure having a plurality of isolated chambers formed therein, a gas distribution assembly disposed in each processing chamber, a gas source connected to the plurality of isolated chambers, and a power supply connected to each gas distribution assembly.
Claims28
A tandem vacuum processing chamber, comprising a chamber body defining a first and a second processing regions, the first and second processing regions comprising:
- a bottom wall;
- an annular sidewall positioned in communication with the bottom wall and configured to separate the first processing region from the second processing region;
- a substrate support assembly centrally positioned in each of the first and second processing regions, the substrate support assembly having an outer perimeter that is symmetric about the annular sidewall;
- a first gas distribution assembly positioned above the first processing region;
- and
- a second gas distribution assembly position above the second processing region.
A tandem substrate processing chamber, comprising:
- a first annular processing region having a first bottom member and a first interior sidewall;
- a first substrate support member positioned in the first annular processing region, the first substrate support member being symmetric about the first interior sidewall;
- a second annular processing region having a second bottom member and a second annular sidewall, the second annular processing region being positioned adjacent to the first processing region such that the second sidewall joins the first sidewall;
- a second substrate support member positioned in the second annular processing region, the second substrate support member being symmetric about the second interior sidewall;
- and
- a pumping assembly in fluid communication with the first and second processing regions.
A tandem vacuum processing chamber, comprising:
- a chamber body having a bottom member;
- a first gas distribution assembly positioned above the bottom member and defining an upper boundary of a first annular processing region;
- a second gas distribution assembly positioned above the bottom member and defining an upper boundary of a second annular processing region;
- and
- a substrate support member positioned in each of the first and second processing regions, an outer portion of the substrate support member being parallel to an annular sidewall defining a lateral boundary of each of the processing regions.
Dependencies are inferred from the claim text.