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US 2004/0061844 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsPetrus Matthijs Henricus Vosters, Hernes Jacobs, Harmen Klaas Van Der Schoot, Peter Rutgers
Life of this patent
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Abstract
A linear seal seals over a slot formed in a wall of a vacuum chamber of a lithographic projection apparatus. The linear seal includes an elongate sealing member which is locally displaced from the slot at a selectable position such that conduits may pass from outside of the vacuum chamber to the inside of the vacuum chamber at the local displacement of the elongate sealing member.
Claims14
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
- a vacuum chamber that encloses at least one of the support structure and the substrate table;
- an elongate through-slot in a wall of the vacuum chamber;
- and
- a linear seal constructed and arranged to seal the vacuum chamber along the slot, wherein the linear seal comprises:
- an elongate sealing member constructed and arranged to seal the vacuum chamber along the slot, the sealing member being locally displaceable at a selectable position to provide an opening into the vacuum chamber.
6 more elements
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, at least one of the substrate and the patterning device being disposed in a vacuum chamber having a wall with an elongate through-slot;
- positioning the substrate or a patterning device in the vacuum chamber;
- sealing the vacuum chamber along the through-slot using a linear seal, wherein the linear seal comprises an elongate sealing member constructed and arranged to seal the vacuum chamber along the through-slot;
- and
- locally displacing the elongate sealing member at a selectable position to provide an opening into the vacuum chamber.
3 more elements
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
- a vacuum chamber that encloses at least one of the support structure and the substrate table;
- an elongate through-slot in a wall of the vacuum chamber;
- and
- a linear seal constructed and arranged to seal the vacuum chamber along the through-slot, the linear seal comprising:
- a rotatable sealing band constructed and arranged to seal against the through-slot.
- sealing the vacuum chamber along the through-slot using a linear seal, wherein the linear seal comprises an elongate sealing member constructed and arranged to seal the vacuum chamber along the through-slot;
- and
- locally displacing the elongate sealing member at a selectable position to provide an opening into the vacuum chamber.
9 more elements
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
- a vacuum chamber that encloses at least one of the support structure and the substrate table;
- an elongate through-slot in a wall of the vacuum chamber;
- and
- a linear seal constructed and arranged to seal the vacuum chamber along the through-slot, the linear seal comprising:
- a rotatable sealing band constructed and arranged to seal against the through-slot.
6 more elements
Dependencies are inferred from the claim text.