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AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsKoichi Kotera, Yoshinao Ooe, Hiroki Kono, Hiroyosi Tanaka
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Disclosed are an electron emission thin-film with improved secondary electron emission characteristics compared with conventional ones, a plasma display panel including the electron emission thin-film, and their manufacturing methods. Using a vacuum deposition system, a protective layer that is an MgO thin-film is formed on a dielectric layer formed on a front glass substrate. At the time of deposition, angles that lines linking the central point of a target material for the protective layer respectively with the central point and both ends points of the front glass substrate form with the front glass substrate are exclusively in a range of 30 to 80°. This enables at least some of MgO columnar crystals constituting the protective layer to have flat planes that are inclined with respect to the surface of the thin-film.
An electron emission thin-film that is formed on a substrate by densely arranging a plurality of columnar crystals so as to extend from the substrate, the columnar crystals being composed of an electron emission material,
An electron emission thin-film formation method for forming an electron emission thin-film on a substrate by depositing a material for the thin-film on the substrate in a reduced-pressure atmosphere,
A plasma display panel that includes a front panel on which first electrodes and a dielectric glass layer that covers the first electrodes are arranged, and a second panel on which second electrodes are arranged, the first panel and the second panel being arranged in such a manner that the dielectric glass layer and the second electrodes are opposed to each other with gap members being interposed therebetween, an address discharge being performed between the first electrodes and the second electrodes to realize addressing,
A plasma display panel manufacturing method including,
Dependencies are inferred from the claim text.