Method and apparatus for nanometer-scale focusing and patterning of ultra-low emittance, multi-MeV proton and ion beams from a laser ion diode

Abstract

Methods and apparatus for focusing proton and ion beams within the profile of the beam envelope of an ultra-low emittance, charge neutralized emission to create a pattern without focusing the entire beam envelope or rastering. In one implementation, a method for use with laser accelerated ion beams comprises the steps: irradiating a surface of a target with pulsed laser irradiation to produce an electron plasma emission on a non-irradiated surface of the target, the electron plasma emission producing an ion beam emission on the non-irradiated surface, the ion beam emission having a beam envelope; and focusing ions of the ion beam emission into a plurality of component beams within the beam envelope as a result of the shape of the non-irradiated surface of the target.

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