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US 2004/0018448 A1Published application
Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC
AssigneeLSI Logic Corporation
InventorsMichael J. Berman, George E. Bailey
Life of this patent
Estimating the term…
Abstract
A method to improve the resolution of a photolithography system by using one or more coupling layers between a photo resist and an anti-reflective coating. The coupling layer(s) compensate for a mis-match in indexes of reflection between the photo resist and anti-reflective coating and minimize the amount of energy which is reflected back into the photo resist, thereby improving the quality of the resulting image which is formed on the photo resist during the process.
Claims13
A method of photolithography comprising:
- providing a wafer;
- depositing a film to be imaged on the wafer;
- applying an anti-reflective coating to the film;
- providing a photo resist;
- and
- providing one or more coupling layers between the anti-reflective coating and the photo resist.
3 more elements
A device configured to be processed using photolithography, said device comprising:
- a wafer;
- a film;
- a photo resist;
- an anti-reflective coating between the photo resist and the film;
- and
- one or more coupling layers between the photo resist and the film.
3 more elements
Dependencies are inferred from the claim text.