Mask inspection method, mask defect inspection system, and method of production of mask

A mask defect inspection system for detecting a pattern defect in a mask having a predetermined pattern of regions passing and blocking an exposure beam so as to transfer that pattern, comprising:

• a memory means for recording preset different acceptable defect sizes for a plurality of conditions differing in at least one of a line and space of the pattern,
• a pattern identifying means for comparing a mask pattern with a reference pattern to detect a defect,
• a measuring means for recognizing the line and space of the pattern at the detected defect part, and
• a defect determining means for selecting an acceptable defect size corresponding to the line and space of the pattern recognized at the defect part from the acceptable defect sizes recorded in the memory means, comparing it with the size of the detected defect, and determining a defect larger than the acceptable defect size as a defect requiring repair.

A mask production method comprising the steps of:

• forming a predetermined pattern of regions passing and blocking an exposure beam in a mask and
• detecting defects of the pattern,
• said step of detecting the defects comprising the steps of:
• presetting different acceptable defect sizes for a plurality of conditions differing in at least one of a line and space of the pattern,
• detecting a defect and recognizing the line and space of the pattern at the defect part,
• selecting an acceptable defect size corresponding to the line and space of the pattern recognized at the defect part and comparing it with the size of the detected defect, and
• determining a defect larger than the acceptable defect size as a defect requiring repair.