Fabrication of b/c/n/o/si doped sputtering targets
AssigneeHeraeus, Inc.
InventorWenjun Zhang
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Abstract
The present invention relates to a method of manufacturing sputtering targets doped with non-metal components including boron, carbon, nitrogen, oxygen and silicon. A powder process is utilized whereby alloyed powders, which contain non-metal elements of B/C/N/O/Si and non-metal containing phases of less than ten microns in microstructure, are blended, canned and subjected to hot isostatic press consolidation. The sputtering targets of the present invention avoid spitting problems during sputtering of the target material on a substrate.
Claims23
A method of fabricating sputter targets doped with a non-metallic addition, the method comprising the steps of
- (a) preparing or selecting raw material elemental powders or alloys which are doped with at least one non-metal, wherein the powders have microstructures of less than about 10 microns;
- (b) canning;
- (c) hot isostatic pressing;
- and
- (d) machining to form a sputter target.
Dependencies are inferred from the claim text.