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US 2004/0006758 A1Published application
Corrected mask pattern verification apparatus and corrected mask pattern verification
AssigneeSharp Kabushiki Kaisha
InventorEiji Aoki
Life of this patent
Estimating the term…
Abstract
A corrected mask pattern verification apparatus includes a graphic operation section for generating differential mask pattern data based on design mask pattern and corrected mask pattern; a graphic reduction-enlargement operation section for reducing the differential mask pattern data and enlarging the reduced differential mask pattern data, and generating graphic reduction-enlargement operation data; and an area comparison operation section for calculating an area of a differential mask pattern represented by the differential mask pattern data and comparing the calculated area with a prescribed area, and generating area comparison operation data indicating an area comparison operation result.
Claims9
A corrected mask pattern verification apparatus for verifying that corrected mask pattern data generated based on design mask pattern data has been properly corrected, the corrected mask pattern verification apparatus comprising:
- a graphic operation section for performing a prescribed graphic operation based on the design mask pattern data and the corrected mask pattern data so as to generate differential mask pattern data indicating a result of the prescribed graphic operation;
- a graphic reduction-enlargement operation section for reducing the differential mask pattern data and enlarging the differential mask pattern data obtained by the reduction, and generating graphic reduction-enlargement operation data indicating a graphic reduction-enlargement operation result;
- a first determination section for determining whether or not the graphic reduction-enlargement operation data includes the differential mask pattern, and generating first determination result data indicating a determination result thereof;
- an area comparison operation section for calculating an area of a differential mask pattern represented by the differential mask pattern data and comparing the calculated area with a prescribed area, and generating area comparison operation data indicating an area comparison operation result;
- a second determination section for determining whether or not the area comparison operation data includes the differential mask pattern data and generating second determination result data indicating a determination result thereof;
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- a third determination section for determining whether or not the corrected mask pattern data has been properly corrected based on the first determination result data and the second determination result data.
4 more elements
A corrected mask pattern verification method for verifying that corrected mask pattern data generated based on design mask pattern data has been properly corrected, the corrected mask pattern verification method, comprising:
- (a) a first graphic differential operation step of deleting the design mask pattern data from the corrected mask pattern data, thereby generating first differential mask pattern data representing a first differential mask pattern;
- (b) a first graphic reduction-enlargement operation step of performing a first reduction on the first differential mask pattern data and then performing a first enlargement on the first mask pattern data obtained by the first reduction, thereby generating first graphic reduction-enlargement operation data indicating a first graphic reduction-enlargement operation result;
- (c) a first determination step of determining whether or not the first graphic reduction-enlargement operation data includes the first differential mask pattern data, thereby generating first determination result data indicating a result thereof;
- (d) a first area comparison operation step of calculating an area of the first differential mask pattern based on the first differential mask pattern data, and comparing the area of the first differential mask pattern with a first prescribed area, thereby generating first area comparison operation data indicating a result thereof;
- (e) a second determination step of determining whether or not the first area comparison operation data includes the first differential mask pattern data, thereby generating second determination result data indicating a result thereof;
- (f) a second graphic differential operation step of deleting the corrected mask pattern data from the design mask pattern data, thereby generating second differential mask pattern data representing a second differential mask pattern;
- (g) a second graphic reduction-enlargement operation step of performing a second reduction on the second differential mask pattern data and then performing a second enlargement on the second mask pattern data obtained by the second reduction, thereby generating second graphic reduction-enlargement operation data indicating a second graphic reduction-enlargement operation result;
- (h) a third determination step of determining whether or not the second graphic reduction-enlargement operation data includes the second differential mask pattern data, thereby generating third determination result data indicating a result thereof;
- (i) a second area comparison operation step of calculating an area of the second differential mask pattern based on the second differential mask pattern data, and comparing the area of the second differential mask pattern with a second prescribed area, thereby generating second area comparison operation data indicating a result thereof;
- (j) a fourth determination step of determining whether or not the second area comparison operation data includes the second differential mask pattern data, thereby generating fourth determination result data indicating a result thereof;
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- (k) a fifth determination step of determining whether or not the corrected mask pattern data has been properly corrected based on the first determination result data, the second determination result data, the third determination result data, and the fourth determination result data.
9 more elements
A corrected mask pattern verification method for verifying that corrected mask pattern data generated based on design mask pattern data has been properly corrected, the corrected mask pattern verification method, comprising:
- (a) a graphic operation step of generating a differential mask pattern data representing an exclusive-OR of the design mask pattern data and the corrected mask pattern data;
- (b) a graphic reduction-enlargement operation step of performing a reduction on the differential mask pattern data and then performing an enlargement on the differential mask pattern data obtained by the reduction, thereby generating graphic reduction-enlargement operation data indicating a graphic reduction-enlargement operation result;
- (c) a first determination step of determining whether or not the graphic reduction-enlargement operation data includes the differential mask pattern data, thereby generating first determination result data indicating a result thereof;
- (d) an area comparison operation step of calculating an area of the differential mask pattern based on the differential mask pattern data, and comparing the calculated area of the differential mask pattern with a prescribed area, thereby generating area comparison operation data indicating a result thereof;
- (e) a second determination step of determining whether or not the area comparison operation data includes the differential mask pattern data, thereby generating second determination result data indicating a result thereof;
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- (f) a third determination step of determining whether or not the corrected mask pattern data has been properly corrected based on the first determination result data and the second determination result data.
4 more elements
Dependencies are inferred from the claim text.