Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique
AssigneeASML Masktools B.V.
InventorsJang Fung Chen, Douglas Van Den Broeke
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Abstract
A method of generating a mask for use in printing a target pattern on a substrate. The method includes the steps of: (a) determining a target pattern representing a circuit design to be printed on a substrate; (b) generating a first pattern by scaling the target pattern by a factor of 0.5; and (c) generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The second pattern is then utilized to print the target pattern on the substrate.
Claims15
A method of generating a mask for use in an imaging system, said method comprising the steps of:
- (a) determining a target pattern representing a circuit design to be printed on a substrate;
- (b) generating a first pattern by scaling said target pattern by a factor of less than 1;
- and
- (c) generating a second pattern by performing a Boolean operation which combines said target pattern and said first pattern.
An apparatus for generating a mask for use in printing a target pattern on a substrate, said method comprising the steps of:
- means for determining a target pattern representing a circuit design to be printed on a substrate;
- means for generating a first pattern by scaling said target pattern by a factor of less than 1;
- and
- means for generating a second pattern by performing a Boolean operation which combines said target pattern and said first pattern.
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a mask for use in a lithographic imaging process, said generation of said file comprising the steps of:
- (a) determining a target pattern representing a circuit design to be printed on a substrate;
- (b) generating a first pattern by scaling said target pattern by a factor of less than 1;
- and
- (c) generating a second pattern by performing a Boolean operation which combines said target pattern and said first pattern.
Dependencies are inferred from the claim text.