Fluorination treatment apparatus, process for producing fluorination treated substance, and fluorination treated substance
AssigneeShowa Denko K.K., Nikon Corporation
InventorsYasuyuki Hoshino, Yusuke Taki
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AssigneeShowa Denko K.K., Nikon Corporation
InventorsYasuyuki Hoshino, Yusuke Taki
Estimating the term…
According to the invention, a fluorination treated substance remarkably reduced in the light absorption loss of a substance to be treated, such as a fluoride thin film, a fluorination treatment apparatus capable of producing the fluorination treated substance, and a process for producing a fluorination treated substance can be provided. Disclosed is a process for producing a fluorination treated substance, comprising an enclosure step of enclosing a substance to be treated in a reactor and a fluorination reaction step of introducing a fluorine gas into the reactor to bring the substance to be treated into contact with the fluorine gas and thereby carry out fluorination reaction.
A fluorination treatment apparatus comprising a fluorine gas storage/feed vessel for storing and feeding a fluorine gas, a reactor for bringing a substance to be treated into contact with a fluorine gas to carry out fluorination reaction, and a fluorine gas pipe arranged between the fluorine gas storage/feed vessel and the reactor, wherein at least a portion to be brought into contact with the fluorine gas is constituted of a material having a chromium concentration of not more than 1% and/or a titanium concentration of not more than 1%.
A process for producing a fluorination treated substance, comprising:
A process for producing a fluorination treated substance, comprising:
A process for producing a fluorination treated substance, comprising:
A process for producing a fluorination treated substance, comprising:
Dependencies are inferred from the claim text.